Chen F. Principles of plasma processing

Taylor & Francis Routledge, 2004. — 852 p. Plasma (Ionized gases) , Plasma engineering, Plasma (Gaz-ionisÃs) , Plasmas, Technique des. Fundamentals of Plasma Physics and Plasma Chemistry; Physics and Engineering of Electric Discharges.

Wiley-VCH, 2010. 232 p. — ISBN: 3527327630. Written by a university lecturer with more than forty years experience in plasma technology, this book adopts a didactic approach in its coverage of the theory, engineering and applications of technological plasmas. The theory is developed in a unified way to enable brevity and clarity, providing readers with the necessary background...