Voigt A. (Ed.) Multiscale Modeling in Epitaxial Growth

Birkhäuser Verlag, Switzerland, 2005. — 240 p. —(ISNM. Volume 149) — ISBN: 3764372087Epitaxy is relevant for thin film growth and is a very active area of theoretical research since several years. Recently powerful numerical techniques have been used to link atomistic effects at the film's surface to its macroscopic morphology. This book also serves as an introduction into this highly active interdisciplinary field of research for applied mathematicians, theoretical physicists and computational materials scientists. Mini-Workshop at Mathematisches Forschungsinstitut Oberwolfach January 18–24, 2004.Atomistic Models
Lattice Gas Models and Kinetic Monte Carlo Simulations of Epitaxial Growth
Cluster Diffusion and Island Formation on fcc(111) Metal Surfaces Studied by Atomic Scale Computer Simulations
A Multiscale Study of the Epitaxial CVD of Si from Chlorosilanes
Off-lattice Kinetic Monte Carlo Simulations of Strained Heteroepitaxial Growth
Quasicontinuum Monte Carlo Simulation of Multilayer Surface Growth
Step Flow Models
Introduction to Step Dynamics and Step Instabilities
A Finite Element Framework for Burton-Cabrera-Frank Equation
Edge Diffusion in Phase-Field Models for Epitaxial Growth
Discretisation and Numerical Tests of a Diffuse-Interface Model
Islands in the Stream: Electromigration-Driven Shape Evolution with Crystal Anisotropy
Simulation of Ostwald Ripening in Homoepitaxy
Continuum Models
Continuum Models for Surface Growth
Configurational Continuum Modelling of Crystalline Surface Evolution
On Level Set Formulations for Anisotropic Mean Curvature Flow and Surface Diffusion